About 12 Trademarks found that are filed by the attorney Brian Flynn

Computer software for controlling the metrology measuring device modules that are attached to units that process semiconductor wafers

Metrology products for optimizing manufacturing processes through the science of measurement

software expert system for the automatic analysis of optical data, e;g;, reflectometry, ellipsometry, scatterometry, or any combination thereof, to determine film thicknesses and/or optical constants of materials; It is applicable to single films or multiple-film stacks on any sample

NANO CLIP

Metrology system for the detection and measurement of particles and defects comprised principally of low distortion optics, a high intensity broadband light source, high resolution detector, and image processing and defect detection software, that enables inspection of both the front and backside of a sample, particularly, a semiconductor wafer, mask, flat panel display, or magnetic substrate

combination of optical metrology instruments for measuring such things as microscopic dimensions and film thickness features of samples, particularly, of semiconductor wafers, flat panel displays and magnetic media

Metrology instrument, namely, apparatus for measuring thickness and/or optical properties of films on samples

Scientific instrument for metrology applications, namely, a metrology unit which is used to measure the critical dimensions and overlay registration achieved in submicron optical lithography

Metrology and inspection systems for integration into semiconductor wafer, magnetic read-write head, and flat panel display processing and related equipment; such as, but not limited to, chemical mechanical polishers, chemical vapor deposition reactors, physical vapor deposition reactors, rapid thermal processors, wet and dry etchers, epitaxial reactors, ion implanters, material handlers, lithography track and exposure systems, and assemblies thereof

A metrology tool for measuring the thickness, and analyzing the composition of certain films such as, but not limited to, polycrystalline films deposited on substrates including, but not limited to, semiconductor wafers, flat panel display substrates and magnetic head substrates, such film properties are determined by various methods such as, but not limited to, reflectometry, ellipsometry and interferometry