About 10 Trademarks found that are owned by Oxford Instruments Nanotechnology Tools Limited

Electron backscatter diffraction cameras; electron backscatter diffraction cameras used in relation to electron beam microscopes; electron backscatter diffraction cameras used in relation to ion beam microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to electron microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to ion beam microscopes

Silicon drift detectors for X-ray analysis, not for medical use; silicon drift detectors for energy-dispersive X-ray spectroscopy, not for medical use; silicon drift detectors for wavelength dispersive X-ray spectroscopy, not for medical use

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

computer software for use with electron and ion-beam microscopes that uses the EDS (Energy Dispersive Spectroscopy) microanalysis technique to calculate the various film thicknesses and compositions that are present in a sample; computer software for measuring samples inside microscopes, including electron and ion-beam microscopes; computer software for processing X-ray data acquired from multi-layered samples inside an electron or ion-beam microscope to calculate the various film thicknesses and compositions that are present

Measurement apparatus for the semiconductor industry; computer hardware and downloadable software in the field of wafers and semiconductor processing for the purpose of the control and operation of plasma etching machines, semiconductor processing machines for etching substrates, semiconductor processing machines for etching semiconductor wafers, robotic wafer handlers and robotic handling apparatus; laboratory plasma apparatus and instruments for use in research; replacement parts for the aforesaid goods

Plasma etching machine tools for measurement; plasma etching machines; semiconductor processing machines for etching substrates; semiconductor processing machines for etching semiconductor wafers; robotic wafer handlers; robotic handling apparatus

Computer hardware and downloadable software for use in the field of wafers and semiconductor processing for the purpose of the control and operation of plasma etching machines, semiconductor processing machines for etching substrates, semiconductor processing machines for etching semiconductor wafers, robotic wafer handlers and robotic handling apparatus; laboratory apparatus and instruments for handling and plasma treatment of semiconductor wafers, plastics or other materials; plasma cluster tools, all being laboratory apparatus and instruments; laboratory plasma apparatus and instruments for use in research; replacement parts for the aforesaid goods

Plasma etching machines; semiconductor processing machines for etching substrates; semiconductor processing machines for etching semiconductor wafers; robotic wafer handlers; robotic handling apparatus

Apparatus and instruments for plasma deposition for manufacturing and processing semiconductors for plasma deposition and thermal growth for manufacturing and processing semiconductors; apparatus and instruments for manufacturing, processing and plasma treatment of semiconductor wafers, plastics or other materials; plasma cluster tools, all being laboratory apparatus and instruments; laboratory apparatus and instruments for plasma research; computer hardware and downloadable software for for the purpose of the control and operation of vapor deposition machines, plasma deposition and thermal growth machines, apparatus and instruments for thin film processing namely, atomic layer deposition tools, chemical vapour deposition tools, etch tools and cluster tools and flexible plasma processing apparatus for plasma etching and plasma deposition; replacement parts for the aforesaid goods

Vapor deposition machines for use in manufacturing semiconductors; plasma deposition and thermal growth machines for use in manufacturing semiconductors; apparatus and instruments for thin film processing namely, atomic layer deposition tools, chemical vapour deposition tools, etch tools and cluster tools; flexible plasma processing apparatus for plasma etching and plasma deposition

Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, namely, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and other materials, scientific instruments used to etch silicon and other materials, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via very high frequency electrode excitation; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and other materials, scientific instruments used to etch silicon and other materials; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods