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COBRA
Live/Registered
SECTION 71 ACCEPTED

on 06 Nov 2024

Last Applicant/ Owned by

Serial Number

79120265 filed on 02th Aug 2012

Registration Number

4420301 registered on 22nd Oct 2013

in the Principal Register

Correspondent Address

Mainak H. Mehta

Filing Basis

1. filing basis filed as 66 a

Disclaimer

NO DATA

COBRA

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to Read More

Classification Information


Class [009]
Computer & Software Products & Electrical & Scientific Products


Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods


First Use Date in General

N/A

First Use Date in Commerce

N/A

Mark Details


Serial Number

No 79120265

Mark Type

No Service/Collective Mark

Attorney Docket Number

No 120776OIN002

44D Filed

No

44D Current

No

44E filed

No

44E Current

No

66A Filed

Yes

66A Current

Yes

Current Basis

No

No Basis

No

Legal History


Show more

Status DateAction Taken
06th Nov 2024NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
06th Nov 2024REGISTERED-SEC.71 ACCEPTED
04th Nov 2024CASE ASSIGNED TO POST REGISTRATION PARALEGAL
10th Mar 2024TEAS SECTION 71 RECEIVED
22nd Oct 2022COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
16th Sep 2022INTERNATIONAL REGISTRATION RENEWED
20th Jun 2019NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
20th Jun 2019REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
14th Jun 2019TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
10th May 2019POST REGISTRATION ACTION MAILED - SEC. 71 & 15