About 14 Trademarks found that are filed by the law firm Brian Flynn

Computer software for controlling the metrology measuring device modules that are attached to units that process semiconductor wafers

Apparatus for handling semi-conductor wafers designed to support multiple metrology measuring device modules

Metrology products for optimizing manufacturing processes through the science of measurement

software expert system for the automatic analysis of optical data, e;g;, reflectometry, ellipsometry, scatterometry, or any combination thereof, to determine film thicknesses and/or optical constants of materials; It is applicable to single films or multiple-film stacks on any sample

NANO CLIP

Metrology system for the detection and measurement of particles and defects comprised principally of low distortion optics, a high intensity broadband light source, high resolution detector, and image processing and defect detection software, that enables inspection of both the front and backside of a sample, particularly, a semiconductor wafer, mask, flat panel display, or magnetic substrate

combination of optical metrology instruments for measuring such things as microscopic dimensions and film thickness features of samples, particularly, of semiconductor wafers, flat panel displays and magnetic media

Metrology instrument utilizing an optical technique for measuring microscopic features on samples, such as semiconductor wafers, flat panel displays and magnetic media

Metrology instrument, namely, apparatus for measuring thickness and/or optical properties of films on samples

Scientific instrument for metrology applications, namely, a metrology unit which is used to measure the critical dimensions and overlay registration achieved in submicron optical lithography