TOKUYAMA

Class [001]
Chemical Products

[ Chemicals for use in industry, namely, alkalies, bases being chemical preparations for use in industry, acids used in industry, namely, hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, silicic acid, carbonic acid, acetic acid, salts for industrial purposes, namely, halides and halogen acid salts, calcium chloride, carbonates, sodium carbonate, sodium bicarbonate, sulphates, nitrates, acetates, organic halogenides, silicate, calcium silicate, sodium silicate, magnesium salts, magnesium carbonate, oxides, anhydrides being chemical preparations for use in industry, simple substances for industrial purposes, namely, chlorine, boron, salts of alkaline metals, chlorides, namely, calcium chloride, sodium chlorite, sodium hypochlorite, sodium chlorate, carbonates, calcium salts, silicates for industrial purposes, namely, calcium silicate, sodium silicate, alcohols for industrial purposes, namely, methyl alcohol, ethyl alcohol, isopropyl alcohol, organic halogenides, caustic sodas for industrial purposes, soda ashes, calcium chlorides, magnesium chlorides, calcium silicates and ] silicas, [ sodium silicates for industrial purposes, ] silicon dioxides for industrial purposes, aluminum nitrides for industrial purposes, [ ammonias for industrial purposes, sulphuric acids, ion-exchange resins being chemical preparations, ion-exchange resin membranes being chemical preparations, ion-exchangers being chemical preparations, household-use moisture absorbents, namely, chemical compositions for solidification of fluids and for absorbing spills being deliquescent salts such as calcium chloride stored therein for use in closed storehouses and closets, surface-active agents, namely, surface active compounds for general use in the industrial arts, namely, as wetting, spreading, emulsifying, dispersing and penetrating agents, catalysts for use in the manufacture of industrial chemicals, water-purifying chemicals used for drinking water, chemical substances for preserving foodstuffs, protecting groups for amino groups being chemicals for use in manufacturing pharmaceutical preparations, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing veterinary and sanitary preparations, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing disinfectants, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing preparations for destroying vermin, namely, Di-Tertiary-Butyl-Dicarbonate, protecting groups for amino groups being chemicals for use in manufacturing fungicides and herbicides, namely, Di-Tertiary-Butyl-Dicarbonate, propylenes for industrial purposes, chemicals consisting primarily of acrylates monomer and methacrylates monomer for use in manufacturing plastic lens, photochromic chemical compounds for use in manufacturing plastic lens, chemical preparations used in plastics coating, chemical reagents other than for medical purposes, condensing agent other than for medical and veterinary purposes, namely, condensing agent for use in the manufacture of pharmaceutical products and agricultural chemicals and intermediates, diagnostic preparations other than for medical or veterinary purposes, anti-freezing and de-icing preparations, soil stabilizing agents, namely, soil stabilizing agents comprising cement, soil stabilizing agents comprising lime, soil stabilizing agents comprising silicates, halides and halogen acid salts; unprocessed plastics for industrial purposes; polypropylene resins for industrial purposes; polyvinylchloride resins for industrial purposes; plant growth regulating preparations; fertilizers; ] polycrystalline silicons for industrial purposes; [ chemical preparations for cleaning metals for industrial purposes; detergents for industrial use; aluminum nitride ceramics, namely, ceramic powders and glazings for industrial purposes; photoresist chemicals, namely, photoresist for use in the manufacture of integrated circuits, semiconductor devices and other electronic devices; electron beam resist for use in the manufacture of integrated circuits, semiconductor devices and other electronic devices; developers being chemicals for removal of photoresist materials used in the manufacture of printed circuit boards ]