SECOND EXTENSION - GRANTED
granted
on 08 Jul 2024
Last Applicant/ Owned by
2-7-1, Nihonbashi, Chuo-ku
Tokyo
103-6020
Serial Number
97697460 filed on 30th Nov 2022
Registration Number
N/A
Correspondent Address
M. Scott Alprin
Filing Basis
1. intent to use
2. intent to use current
Disclaimer
NO DATA
SST
Photoresists; photoresists applied in semiconductor manufacturing process, namely, lithography; detergents for use in the manufacture of semiconductors; detergents applied in semiconductor manufacturing process, namely, wafer cleaning, lithography and etching
Classification Information
Class [001]
Chemical Products
Photoresists; photoresists applied in semiconductor manufacturing process, namely, lithography; detergents for use in the manufacture of semiconductors; detergents applied in semiconductor manufacturing process, namely, wafer cleaning, lithography and etching
First Use Date in General
N/A
First Use Date in Commerce
N/A
Mark Details
Serial Number
No 97697460
Mark Type
No Service/Collective Mark
Attorney Docket Number
No 0020426
44D Filed
No
44D Current
No
44E filed
No
44E Current
No
66A Filed
No
66A Current
No
Current Basis
No
No Basis
No
Design Code(s)
25.01.01 -
Frames for pictures and the like
26.07.01 -
Plain diamonds with single or multiple line borders
Legal History
| Status Date | Action Taken |
|---|---|
| 08th Jul 2024 | SOU EXTENSION 2 FILED |
| 08th Jul 2024 | SOU EXTENSION 2 GRANTED |
| 08th Jul 2024 | NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED |
| 08th Jul 2024 | SOU TEAS EXTENSION RECEIVED |
| 15th Dec 2023 | NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED |
| 13th Dec 2023 | SOU EXTENSION 1 GRANTED |
| 13th Dec 2023 | SOU EXTENSION 1 FILED |
| 13th Dec 2023 | SOU TEAS EXTENSION RECEIVED |
| 08th Aug 2023 | NOA E-MAILED - SOU REQUIRED FROM APPLICANT |
| 13th Jun 2023 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |