About 30,000 Trademarks found for “huizhou caier stationery sports goods co ltd”

Chicken Parts

Custom manufacture of portable ice chests used to carry food and beverages

The English translation of the mark, "CONTOUR DU CORPS" is "bodily contour".

Periodical magazine featuring content of interest to users of mid-range computers

The mark consists of the word "COPIC" with a stylized letter "i".

Electrodes for medical use, namely, adhered-to or printed-on laryngeal monitoring electrodes for placement on endotracheal tubes

Mattress pads; Bed sheets

The mark consists of wording "COTUO" in the stylized form.

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

The drawing is amended to appear as follows: PUBLISH NEW CUT