on 12 Feb 2024
Last Applicant/ Owned by
Tietotie 3
Espoo
FI
FI-02150
Serial Number
79106107 filed on 17th Aug 2011
Registration Number
4296791 registered on 05th Mar 2013
Correspondent Address
Anthony J. Malutta
Filing Basis
1. filing basis filed as 66 a
Disclaimer
NO DATA
Machines and machine tools for atomic scale layer deposition; atomic scale layer deposition apparatus, namely, industrial chemical [ and industrial photochemical ] reactors; reactor systems consisting of several industrial chemical [ and industrial photochemical ] reactors, precursor sources, inactive gas sources, plasma sources, source units, loading units, lift units, substrate holders, depositi Read More
Treatment and coating of materials by atomic scale layer deposition method and consulting connected thereto
N/A
N/A
Data processing equipment; computers and computer programmes for controlling and monitoring atomic scale layer deposition apparatus, namely, reactors and reactor systems consisting of several reactors, for collecting data from aforementioned atomic scale layer deposition apparatus, user interface software for aforementioned atomic scale layer deposition apparatus, computer software enabling aforementioned atomic scale layer deposition apparatus to interface and communicate with devices used in connection with aforementioned atomic scale layer deposition apparatus, computer software for controlling and monitoring devices used in connection with aforementioned atomic scale layer deposition apparatus
N/A
N/A
Machines and machine tools for atomic scale layer deposition; atomic scale layer deposition apparatus, namely, industrial chemical [ and industrial photochemical ] reactors; reactor systems consisting of several industrial chemical [ and industrial photochemical ] reactors, precursor sources, inactive gas sources, plasma sources, source units, loading units, lift units, substrate holders, deposition cartridges, diffusion enhancers, gas treatment units, particle traps, water cooling units and chillers, all of which are sold as an integral part of the atomic scale layer deposition industrial chemical [ and industrial photochemical ] reactors; and reactor systems consisting of several industrial chemical [ and industrial photochemical ] reactors as described above
N/A
N/A
No 79106107
No Service Mark
No 1438191
No
No
No
No
Yes
Yes
No
No
Status Date | Action Taken |
---|---|
11th Oct 2024 | NEW REPRESENTATIVE AT IB RECEIVED |
13th Aug 2024 | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED |
12th Aug 2024 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
09th Aug 2024 | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED |
09th Aug 2024 | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS |
09th Aug 2024 | TEAS CHANGE OF OWNER ADDRESS RECEIVED |
09th Aug 2024 | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED |
09th Aug 2024 | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED |
09th Aug 2024 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
02th Aug 2024 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |