About 2 Trademarks found that are owned by Ccr Gmbh

MATERIAL TREATMENT, PLASMA PROCESSING AND SURFACE TREATMENT, NAMELY DRY ETCHING OF SEMICONDUCTOR DEVICE STRUCTURES, SURFACE CLEANING AND REMOVAL OF OXIDES AND CONTAMINANTS; REACTIVE ETCHING, SPUTTERING AND TREATMENT OF POLYMERIC SURFACES; APPLICATIONS OF AGENTS TO CONTROL WETTABILITY OF POLYMERIC SURFACES, FABRICS, GLASS AND PAPER; DOPING FORMATION OF ULTRASHALLOW JUNCTIONS AND CONFORMAL DOPING OF TRENCH STRUCTURES, CUSTOM MANUFACTURE OF SEMICONDUCTOR COMPONENTS, NAMELY SEEDING FOR PLANARIZED SELECTIVE METAL DEPOSITION AND FORMATION OF MULTILEVEL INTERCONNECTS OF METAL IMPURITIES; FORMATION OF GETTERING LAYERS BY INTRODUCTION OF NOBLE GASES, HYDROGEN, ISOLECTRONIC ELEMENTS AND DOPANT SPECIES, FORMATION OF SILICON-ON-INSULATOR STRUCTURES, FORMATION OF ETCH-STOP LAYERS FOR SILICON MICROMACHINING, AND FORMATION OF HYDROGEN AND HELIUM INDUCED CAVITIES FOR LIGHT EMITTING; PLASMA STERILIZATION OF MEDICAL INSTRUMENTS AND MATERIALS; PLASMA STERILIZATION OF PACKING MATERIALS; AND VACUUM COATING OF MEMBRANES AND SENSORS BY CATHODIC ARC DEPOSITION

MATERIAL TREATMENT, PLASMA PROCESSING AND SURFACE TREATMENT, NAMELY DRY ETCHING OF SEMICONDUCTOR DEVICE STRUCTURES, SURFACE CLEANING AND REMOVAL OF OXIDES AND CONTAMINANTS; REACTIVE ETCHING, SPUTTERING AND TREATMENT OF POLYMERIC SURFACES; APPLICATIONS OF AGENTS TO CONTROL WETTABILITY OF POLYMERIC SURFACES, FABRICS, GLASS AND PAPER; DOPING FORMATION OF ULTRASHALLOW JUNCTIONS AND CONFORMAL DOPING OF TRENCH STRUCTURES, CUSTOM MANUFACTURE OF SEMICONDUCTOR COMPONENTS, NAMELY SEEDING FOR PLANARIZED SELECTIVE METAL DEPOSITION AND FORMATION OF MULTILEVEL INTERCONNECTS OF METAL IMPURITIES; FORMATION OF GETTERING LAYERS BY INTRODUCTION OF NOBLE GASES, HYDROGEN, ISOLECTRONIC ELEMENTS AND DOPANT SPECIES, FORMATION OF SILICON-ON-INSULATOR STRUCTURES, FORMATION OF ETCH-STOP LAYERS FOR SILICON MICROMACHINING, AND FORMATION OF HYDROGEN AND HELIUM INDUCED CAVITIES FOR LIGHT EMITTING; PLASMA STERILIZATION OF MEDICAL INSTRUMENTS AND MATERIALS; PLASMA STERILIZATION OF PACKING MATERIALS; AND VACUUM COATING OF MEMBRANES AND SENSORS BY CATHODIC ARC DEPOSITION

LASERS FOR PLASMA DIAGNOSTICS NOT FOR MEDICAL USE; FOCUSED PLASMA ION BEAM INSTRUMENTS FOR IMAGING AND MEASUREMENTS; EQUIPMENT FOR RECORDING, TRANSFER AND REPRODUCTION OF SOUND AND DISPLAYS, NAMELY, AUDIO TAPE RECORDERS, VIDEO TAPE RECORDERS AND EVENT RECORDERS; DATA PROCESSORS; COMPUTERS, BLANK MAGNETIC RECORDING MEDIA, NAMELY, MAGNETIC RECORD TAPES AND CASSETTES; BAR CODE SCANNERS; FLAT PANEL DISPLAYS; MAGNETIC RECORDING MEDIA WITH DIAMOND-LIKE CARBON AND MODIFIED SURFACES, NAMELY, BLANK AUDIOTAPES AND BLANK VIDEOTAPES; SEMICONDUCTORS DRY-ETCHED WITH OPTICAL COATINGS, NAMELY LASER MIRRORS, OPTICAL MULTILAYERS AND HEAT RESISTANT PROJECTOR GLASSES

MACHINES AND TOOL MACHINES, NAMELY FOR DRY ETCHING OF SEMICONDUCTOR DEVICE STRUCTURES, FOR WETTABILITY CONTROL OF POLYMERIC SURFACES, FABRICS, GLASS AND PAPER, ION IMPLANTATION, AND FOR APPLICATION OF VACUUM COATINGS

CASTING ALLOYS, NAMELY TITANIUM BASED ALLOYS, ESPECIALLY TiN, TiAIN AND TiCN, ALUMINUM BASED ALLOYS

MEDICATED LOTIONS WITH ENHANCED OLIGODYNAMIC PROPERTIES FOR TREATING BURNS AND OTHER INJURIES

INDUSTRIAL LUBRICANTS, ESPECIALLY NITROGENATED AMORPHOUS CARBON AND CARBON NITRIDE, AND POLYCHRYSTALLINE DIAMOND

DEVELOPING TOMORROW SURFACE

Barcode readers, magnetic recording media, namely, blank computer magnetic recording tapes and blank computer floppy disks, flat picture screens, namely, flat panel displays, blank hard computer disks, and read and write heads for blank hard computer disks