ABANDONED - FAILURE TO RESPOND OR LATE RESPONSE
failure to respond or late response
on 24 Oct 2024
Last Applicant/ Owned by
Naniwa-ku, Osaka-shi Osaka 556-0022
JP
Serial Number
79383794 filed on 21st Jul 2023
Registration Number
N/A
Correspondent Address
2-8, Bakuromachi 3-Chome,
Osaka 541-0059,
JAPAN
Filing Basis
1. filing basis filed as 66 a
Disclaimer
NO DATA
NITTA DUPONT
Hydrophilic chemical agents for industrial purposes; detergents for industrial use; chemicals; chemically reactive solutions for use with abrasives for semiconductors; chemically reactive solutions for use with abrasives for electronic substrates; auxiliary fluids for use with abrasives Abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing preparations; semiconduc Read More
Classification Information
Class [007]
Machinery Products
Work holding instruments for semiconductor wafer polishing machines and apparatus; templates for semiconductor wafer polishing machines and apparatus; blank templates for semiconductor wafer polishing machines and apparatus; mounting pads and sheets for semiconductor wafer polishing machines and apparatus; polishing pads for semiconductor wafer polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer polishing machines and apparatus; semiconductor wafer polishing machines and apparatus; parts and accessories of semiconductor wafer polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting pads and sheets for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting pads and sheets for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting pads and sheets for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting pads and sheets for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; polishing pads for electric polishing machines; polishing cloths used as parts or accessories of electric polishing machines
First Use Date in General
N/A
First Use Date in Commerce
N/A
Class [003]
Cosmetics and Cleaning Products
Abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations; pads impregnated with polishing preparations; impregnated cloths for polishing; grinding preparations; sharpening preparations; abrasives; scouring solutions; metal polishes; hydrophilic agents for industrial polishing; chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates
First Use Date in General
N/A
First Use Date in Commerce
N/A
Class [001]
Chemical Products
Hydrophilic chemical agents for industrial purposes; detergents for industrial use; chemicals; chemically reactive solutions for use with abrasives for semiconductors; chemically reactive solutions for use with abrasives for electronic substrates; auxiliary fluids for use with abrasives
First Use Date in General
N/A
First Use Date in Commerce
N/A
Mark Details
Serial Number
No 79383794
Mark Type
No Service/Collective Mark
Attorney Docket Number
No
44D Filed
No
44D Current
No
44E filed
No
44E Current
No
66A Filed
Yes
66A Current
Yes
Current Basis
No
No Basis
No
Design Code(s)
09.07.08 -
Parts of footwear
26.17.09 -
Curved line(s), band(s) or bar(s)
Legal History
| Status Date | Action Taken |
|---|---|
| 24th Oct 2024 | ABANDONMENT NOTICE MAILED - FAILURE TO RESPOND |
| 24th Oct 2024 | ABANDONMENT - FAILURE TO RESPOND OR LATE RESPONSE |
| 08th Apr 2024 | REFUSAL PROCESSED BY IB |
| 19th Mar 2024 | REFUSAL PROCESSED BY MPU |
| 19th Mar 2024 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
| 27th Feb 2024 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| 26th Feb 2024 | NON-FINAL ACTION WRITTEN |
| 14th Feb 2024 | ASSIGNED TO EXAMINER |
| 05th Dec 2023 | APPLICATION FILING RECEIPT MAILED |
| 01st Dec 2023 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED |