no statement of use filed
on 24 Oct 2002
Last Applicant/ Owned by
Wilhelm-Rohn-Strasse 25
63450 Hanau
DE
Serial Number
75680873 filed on 07th Apr 1999
Registration Number
N/A
Correspondent Address
HELEN HILL MINSKER
HELEN HILL MINSKER
BEVERIDGE, DEGRANDI, WEILACHER & YOUNG
1850 M STREET, N.W., SUITE 800
WASHINGTON, D.C. 20036
Filing Basis
1. intent to use
2. intent to use current
Disclaimer
NO DATA
Material treatment services in the field of sputtering targets and sputtering materials; custom manufacturing of sputtering targets and sputtering materials for others solders used in the field of preparation of sputter cathodes; unshaped, partially shaped, and fully shaped non-noble metals and non-metal and their alloys, namely, aluminum, iron, silicon, molybdenum, tungsten, cobalt, copper, nick Read More
adhesives, namely, thermally stable adhesives, adhesives containing epoxy resins, and adhesives containing silicon, all in the nature of a coating for use in the preparation of sputter cathodes
solders used in the field of preparation of sputter cathodes; unshaped, partially shaped, and fully shaped non-noble metals and non-metal and their alloys, namely, aluminum, iron, silicon, molybdenum, tungsten, cobalt, copper, nickel, chromium, indium, tin, silicon, alloys containing zinc; metal components in the form of formed pieces, namely, cast pieces, pressed pieces, sintered pieces for use in cathode sputtering and also for use in the electronic, data storage technology, glass, solar technology, construction, and automobile industries, namely, for the reactive or non-reactive plasma produced layers of magnetic storage capability, tribologic layers, low-e glass layers, decorative layers, reflective coatings, anti-reflection coatings, resistance coating, conductive coatings, diffusion coatings, and transparent coatings
Material for vaporization, especially metal and metal alloys products, in particular those made essentially of aluminum, lead, chromium, iron, germanium, gold, indium, copper, nickel, titanium, palladium, platinum, silver, tin, zinc, zirconium-containing alloys as well as metal oxides, in particular aluminum oxide, barium titanate, cerium oxide, chromium oxide, hafnium oxide, magnesium oxide, silicon dioxoide, silicon monoxide, tantalum oxide, titanium oxide, titanium dioxide, zircon oxide containing alloys is as well as fluorides in particular, magnesium fluorides, cryolith, lanthanum fluoride, lithium fluoride, as well as in particular metal sulfides especially antimony sulfide, zinc sulfide, indium antimony containing alloys as well as selenium compounds, in particularly wismuth, selenide, cadmium selenide, indium arsenide, indium selenide, lead selenide, zinc selenide containing alloys as well as tellurides, in particular cadmium tellurides, lead tellurides, zinc tellurides containing alloys; sources of vaporization in particular crystals of high melting materials made of molybdinum, tantalum tungstate, and graphite for melting and vaporization of metals for metal alloys in particular copper, gold, aluminum, silver, chromium, nickel, magnesium, as well as silicon containing alloys for reactive or non-reactive coatings of reflection, anti-reflection, Low-E, decorative or diffusion coatings on substances
unshaped, partially shaped, fully shaped precious metals and their alloys, namely, titanium, gold, platinum, palladium, ruthenium, and osmium; precious metal components in the form of formed pieces, namely, cast pieces, pressed pieces, sintered pieces, and work pieces for use in cathode sputtering and also for use in the electronic, data storage technology, glass, solar technology, construction, and automobile industries, namely, for the reactive or non-reactive plasma produced layers of magnetic storage capability, tribologic layers, low-e glass layers, decorative layers, reflective coatings, anti-reflection coatings, resistance coating, conductive coatings, diffusion coatings, and transparent coatings
Material treatment services in the field of sputtering targets and sputtering materials; custom manufacturing of sputtering targets and sputtering materials for others
No 75680873
No Service Mark
No 32652 WH002
No
No
No
No
No
No
No
No
Status Date | Action Taken |
---|---|
13th Feb 2003 | ABANDONMENT - NO USE STATEMENT FILED |
23rd Apr 2002 | NOA MAILED - SOU REQUIRED FROM APPLICANT |
29th Jan 2002 | PUBLISHED FOR OPPOSITION |
09th Jan 2002 | NOTICE OF PUBLICATION |
21st Nov 2001 | SEC. 44(D) CLAIM DELETED |
08th Mar 2001 | APPROVED FOR PUB - PRINCIPAL REGISTER |
03rd Nov 2000 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
05th May 2000 | NON-FINAL ACTION MAILED |
07th Feb 2000 | ASSIGNED TO EXAMINER |
03rd Feb 2000 | CORRESPONDENCE RECEIVED IN LAW OFFICE |