on 14 Oct 2023
Last Applicant/ Owned by
Naniwa-ku, Osaka-shi, Osaka 556-0022
JP
Serial Number
79150178 filed on 15th Oct 2013
Registration Number
4745696 registered on 02th Jun 2015
Correspondent Address
Helen Hill Minsker
Filing Basis
1. filing basis filed as 66 a
Disclaimer
NO DATA
Chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates Abrasive paper, namely, sand paper; abrasive cloth; abrasive sand; polishing paper; polishing, scouring and abrasive preparations Holding devices for machines for semiconductor wafer surface polishing machines; holding devices for machines for semiconductor wafer surface polishing apparatus; mac Read More
Holding devices for machines for semiconductor wafer surface polishing machines; holding devices for machines for semiconductor wafer surface polishing apparatus; machine templates for semiconductor wafer surface polishing machines; machine templates for semiconductor wafer surface polishing apparatus; blank machine templates for semiconductor wafer surface polishing machines; blank machine templates for semiconductor wafer surface polishing apparatus; mounting pads and sheets for semiconductor wafer surface polishing machines; mounting pads and sheets for semiconductor wafer surface polishing apparatus; polishing pads for semiconductor wafer surface polishing machines; polishing pads for semiconductor wafer surface polishing apparatus; semiconductor wafer surface polishing machines; semiconductor wafer surface polishing apparatus; semiconductor manufacturing machines; semiconductor manufacturing apparatus; holding devices for machines for glass polishing machines; holding devices for machines for glass polishing apparatus; templates for glass polishing machines; templates for glass polishing apparatus; blank templates for glass polishing machines; blank templates for glass polishing apparatus; mounting pads and sheets for glass polishing machines; mounting pads and sheets for glass polishing apparatus; polishing pads for glass polishing machines; polishing pads for glass polishing apparatus; glass polishing machines; glass polishing apparatus; holding devices for machines for glass substrate polishing machines; holding devices for machines for glass substrate polishing apparatus; templates for glass substrate polishing machines; templates for glass substrate polishing apparatus; blank templates for glass substrate polishing machines; blank templates for glass substrate polishing apparatus; mounting pads and sheets for glass substrate polishing machines; mounting pads and sheets for glass substrate polishing apparatus; polishing pads for glass substrate polishing machines; polishing pads for glass substrate polishing apparatus; glass substrate polishing machines; glass substrate polishing apparatus; holding devices for machines for glass disk polishing machines; holding devices for machines for glass disk polishing apparatus; templates for glass disk polishing machines; templates for glass disk polishing apparatus; blank templates for glass disk polishing machines; blank templates for glass disk polishing apparatus; mounting pads and sheets for glass disk polishing machines; mounting pads and sheets for glass disk polishing apparatus; polishing pads for glass disk polishing machines; polishing pads for glass disk polishing apparatus; glass disk polishing machines; glass disk polishing apparatus; holding devices for metal polishing machines for * manufacturing *hard disks; holding devices for metal polishing apparatus for * manufacturing * hard disks; templates for metal polishing machines for * manufacturing * hard disks; templates for metal polishing apparatus for * manufacturing * hard disks; blank templates for metal polishing machines for * manufacturing * hard disks; blank templates for metal polishing apparatus for hard disks; mounting pads and sheets for metal polishing machines for hard disks; mounting pads and sheets for metal polishing apparatus for * manufacturing * hard disks; polishing pads for metal polishing machines for * manufacturing * hard disks; polishing pads for metal polishing apparatus for * manufacturing * hard disks; metal polishing machines for * manufacturing * hard disks; metal polishing apparatus for * manufacturing * hard disks; holding devices for * electric * polishing machines; holding devices for * electric * polishing apparatus; templates for * electric * polishing machines; templates for * electric * polishing apparatus; blank templates for * electric * polishing machines; blank templates for * electric * polishing apparatus; mounting pads and sheets for * electric *polishing machines; mounting pads and sheets for * electric * polishing apparatus; polishing pads for * electric * polishing machines; polishing pads for * electric * polishing apparatus; * electric * polishing machines; * electric * polishing apparatus; polishing cloth for * electric * polishing machines
N/A
N/A
Abrasive paper, namely, sand paper; abrasive cloth; abrasive sand; polishing paper; polishing, scouring and abrasive preparations
N/A
N/A
Chemical slurries for polishing semiconductors; chemical slurries for polishing electronic substrates
N/A
N/A
No 79150178
No Service/Collective Mark
No 006562.00009
No
No
No
No
Yes
Yes
No
No
Status Date | Action Taken |
---|---|
12th May 2024 | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED |
12th May 2024 | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED |
12th May 2024 | DEATH OF INTERNATIONAL REGISTRATION |
20th May 2023 | NEW REPRESENTATIVE AT IB RECEIVED |
24th Oct 2022 | TOTAL INVALIDATION PROCESSED BY THE IB |
25th Sep 2022 | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
23rd Sep 2022 | INVALIDATION PROCESSED |
17th Aug 2022 | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED |
17th Dec 2021 | CANCELLED SECTION 71 |
11th Jun 2020 | CHANGE OF NAME/ADDRESS REC'D FROM IB |