on 27 Jun 2022
Last Applicant/ Owned by
8-1, Shinsugita-cho, Isogo-ku
Yokohama-shi, Kanagawa
JP
235-8522
Serial Number
79154769 filed on 02th Apr 2014
Registration Number
4774790 registered on 21st Jul 2015
Filing Basis
1. filing basis filed as 66 a
Disclaimer
NO DATA
Repair, maintenance and installation of the following goods: apparatus for depositing on semiconductor wafers, apparatus for performing epitaxial growth on semiconductor wafers, apparatus for forming compound semiconductor films on semiconductor wafers, Metal Organic Chemical Vapor Deposition (MOCVD) apparatus, Chemical Vapor Deposition (CVD) apparatus, etching apparatus, semiconductor manufacturi Read More
Repair, maintenance and installation of the following goods: apparatus for depositing on semiconductor wafers, apparatus for performing epitaxial growth on semiconductor wafers, apparatus for forming compound semiconductor films on semiconductor wafers, Metal Organic Chemical Vapor Deposition (MOCVD) apparatus, Chemical Vapor Deposition (CVD) apparatus, etching apparatus, semiconductor manufacturing apparatus and parts, accessories and pipes therefor; repair, maintenance and installation of apparatus and devices used for semiconductor manufacturing apparatus, namely, reduced pressure control apparatus, temperature control apparatus, rotation control apparatus, other control apparatus, gas supply apparatus and their parts, exhaust gas treatment apparatus and their parts, wafer carrier devices, wafer carrier robots, wafer cleaning apparatus, temperature measuring devices, wafer curvature measuring apparatus and parts, accessories and pipes for the aforesaid apparatus and devices; providing information in the fields of repair, maintenance and installation of the aforesaid apparatus and devices, their parts, accessories and pipes
N/A
N/A
Apparatus for depositing on semiconductor wafers; apparatus for performing epitaxial growth on semiconductor wafers; apparatus for forming compound semiconductor films on semiconductor wafers; Metal Organic Chemical Vapor Deposition (MOCVD) apparatus for use in research, development and production; Chemical Vapor Deposition (CVD) apparatus for use in research, development and production; dry etching machines; semiconductor manufacturing apparatus; apparatus and devices used for the aforesaid apparatus, namely, reduced pressure control apparatus, temperature control apparatus, rotation control apparatus, other control apparatus, gas supply apparatus, exhaust gas treatment apparatus, wafer carrier devices, wafer carrier robots, wafer cleaning apparatus, temperature measuring devices, wafer curvature measuring apparatus; parts, accessories and pipes for the aforesaid goods
N/A
N/A
No 79154769
No Service Mark
No 001582.00777
No
No
No
No
Yes
Yes
No
No
Status Date | Action Taken |
---|---|
21st Jul 2024 | COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED |
18th Apr 2024 | INTERNATIONAL REGISTRATION RENEWED |
05th Nov 2022 | NEW REPRESENTATIVE AT IB RECEIVED |
27th Jun 2022 | REGISTERED-SEC.71 ACCEPTED |
27th Jun 2022 | NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED |
27th Jun 2022 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
20th Jan 2022 | TEAS SECTION 71 RECEIVED |
21st Jul 2020 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED |
19th Dec 2018 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
18th Dec 2015 | FINAL DECISION TRANSACTION PROCESSED BY IB |