SECTION 8 & 15-ACCEPTED AND ACKNOWLEDGED
accepted and acknowledged
on 09 Jun 2022
Last Applicant/ Owned by
150 Nakamaruko, Nakahara-ku
Kanagawa
JP
-
Serial Number
86318499 filed on 24th Jun 2014
Registration Number
4890172 registered on 19th Jan 2016
Correspondent Address
Victoria Friedman
Filing Basis
1. intent to use
2. use application currently
Disclaimer
NO DATA
ASF-700
Photographic materials, namely, photographic chemicals for shrinking photoresist patterns in a lithography process; industrial chemicals for shrinking photoresist patterns in a lithography process
Classification Information
Class [001]
Chemical Products
Photographic materials, namely, photographic chemicals for shrinking photoresist patterns in a lithography process; industrial chemicals for shrinking photoresist patterns in a lithography process
First Use Date in General
16th Jan 2007
First Use Date in Commerce
08th Sep 2015
Mark Details
Serial Number
No 86318499
Mark Type
No Service/Collective Mark
Attorney Docket Number
No 10168159TR
44D Filed
No
44D Current
No
44E filed
No
44E Current
No
66A Filed
No
66A Current
No
Current Basis
No
No Basis
No
Legal History
| Status Date | Action Taken |
|---|---|
| 09th Jun 2022 | NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED |
| 09th Jun 2022 | REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK. |
| 08th Jun 2022 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| 17th Dec 2021 | TEAS SECTION 8 & 15 RECEIVED |
| 19th Jan 2021 | COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED |
| 19th Jan 2016 | REGISTERED-PRINCIPAL REGISTER |
| 15th Dec 2015 | NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED |
| 14th Dec 2015 | ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED |
| 17th Nov 2015 | STATEMENT OF USE PROCESSING COMPLETE |
| 05th Nov 2015 | CASE ASSIGNED TO INTENT TO USE PARALEGAL |