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TOK AMERICA
Live/Registered
REGISTERED AND RENEWED

on 23 Oct 2017

Last Applicant/ Owned by

1-7-1 KONAN, MINATO-KU

TOKYO

JP

-

Serial Number

78929296 filed on 13th Jul 2006

Registration Number

3309905 registered on 09th Oct 2007

in the Principal Register

Correspondent Address

Victoria Friedman

Victoria Friedman

Suite 1500

2 North Riverside Plaza

Chicago IL 60606

Filing Basis

1. intent to use

2. use application currently

Disclaimer

NO DATA

TOK AMERICA

Photoresists, namely, organic liquid chemicals used in the fabrication of integrated circuits and developer, namely, chemicals consisting of high-purity water and trace amounts of surfactants used to remove exposed photoresist in the fabrication of integrated circuits

Classification Information


Class [001]
Chemical Products


Photoresists, namely, organic liquid chemicals used in the fabrication of integrated circuits and developer, namely, chemicals consisting of high-purity water and trace amounts of surfactants used to remove exposed photoresist in the fabrication of integrated circuits


First Use Date in General

09th Jan 2006

First Use Date in Commerce

09th Jan 2006

Mark Details


Serial Number

No 78929296

Mark Type

No Service/Collective Mark

Attorney Docket Number

No 30115-103474

44D Filed

No

44D Current

No

44E filed

No

44E Current

No

66A Filed

No

66A Current

No

Current Basis

No

No Basis

No

Legal History


Show more

Status DateAction Taken
21st Jul 2021APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
21st Jul 2021ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
21st Jul 2021TEAS CHANGE OF CORRESPONDENCE RECEIVED
21st Jul 2021TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
21st Jul 2021TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS
21st Jul 2021TEAS CHANGE OF OWNER ADDRESS RECEIVED
21st Jul 2021TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
23rd Oct 2017NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
23rd Oct 2017REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
23rd Oct 2017CASE ASSIGNED TO POST REGISTRATION PARALEGAL